Advanced integration technologies greatly enhance the prospects and reliability of practical quantum sensors, atomic clocks, and quantum information technologies. The performance and proliferation of these devices at chip-scale is contingent upon developing low leak and low gas permeation vacuum cells using wafer-scale techniques. Here we demonstrate both evacuated atomic beam cells and atomic vapor cells using plastic deformation micro-knife bonding of selectively etched fused silica wafers. The cells are characterized using saturated absorption spectroscopy and fluorescence measurements. Vapor cells are mechanically robust exhibiting sheer-force strength ($\sim 15$MPa), demonstrate long lifetimes ($> 1$ year), low residual gas pressures $ (\ll 10^{ -3} \, \text{ mbar}) $, and leak rates below fine-leak testing sensitivity ($\ll 2.8 \times 10^{ -10} \frac{ \text{ mBar} \cdot \text{ L}}{ \text{ s}}$). Micro-knife bonding greatly simplifies the fabrication process for complex chip scale atom-beam devices and atomic vapor cells while identifying a path to future chip-scale cold atom devices, improved chip scale atomic clocks, and fieldable dissipation-dilution-limited optomechanics.
Categories: physics.atom-ph